4 Cave Hollow, West Henrietta, NY - 14586.
E-mail: ssm8867 [at] rit [dot] edu
Phone: (585) 309 3950


Summary
  • Industrial Experience at Fairchild Semiconductor,
  • Sound knowledge of advanced CMOS & MEMS processes including simulation, fabrication, and characterization,
  • Strong background in device physics and device modeling for CMOS, MESFET, HEMT and quantum tunneling devices such as RITD and RTD,
  • Worked extensively with spin-based device fabrication and characterization,
  • M.S. in E.E. with a sound knowledge of analog circuit design,
  • Research Experience as a graduate research assistant on an NSF funded project involving several research groups from U.S. Naval Research Laboratory, Veeco, Micron and Ohio State University among others.
Education
Doctorate of Philosophy, Microsystems Engineering                  [Expected Graduation: November 2009]
        Rochester Institute of Technology, Rochester, N.Y., U.S
        Dissertation Concentration: MRAM Integration with Silicon       G.P.A.: 3.86
Master of Science, Electrical Engineering                                     [Graduation: 2004]
        Rochester Institute of Technology, Rochester, N.Y., U.S
        Thesis: A physics-based model of SiC-based MESFETs                 G.P.A.: 4.00
Bachelor of Engineering, Electronics Engineering                     [Graduation: 2001]
        Kavikulguru Institute of Technology, Ramtek, M.S., India               First Class
Work Experience
[Summer 2006-Present] Research Assistant: RIT, Rochester, NY
        The study of Magnetic Tunnel Structures and Resonant Interband Tunnel Devices for possible integration into non-volatile memory cells.

[Winter 2006] Teaching Assistant: RIT, Rochester, NY (Course: Silicon Processes)
        Assisting students understand the fabrication of the twin-well CMOS process and various tools involved, and evaluating their performance.

[Fall 2006] Teaching Assistant: RIT, Rochester, NY (Course: IC Technology)
        Assisting students understand the fabrication of the metal gate PMOS process and various tools involved, and evaluating their performance.

[Fall 2005-Fall 2006] Research Assistant: RIT, Rochester, NY
        Physics-based modeling of quantum-mechanical devices and the exploration of quantum-mechanical behavior for novel device applications. Proposed a novel device that acts as a THz range frequency selective filter, using a double quatum-well structure.

[Winter 2002-Fall 2005] Research Assistant: RIT, Rochester, NY
        Physics-based modeling of the current collapse observable in SiC MESFETs and accurate I-V modeling of GaN HEMTs.

[Spring 2004] Teaching Assistant: RIT, Rochester, NY (Course: Modeling of Semiconductor Devices and Processes)
        Creating device/circuit simulation exercises using Silvaco & Spectre and numerical techniques for solving Poisson’s Equation and numerical solution on Schrödinger’s equations in simple structures.

[September 2001-April 2002] Research Assistant: Indian Institute of Technology, Calcutta, India
        Optimization of processing costs using a pareto-converging genetic algorithm and a real-valued genetic algorithm. Optimization of stable molecular arrangement of Cu atoms.

Skills
Microfabrication Tools/Processes Familiarity
  • Fabrication Processes/Tools
            Lithography: Suss MA 150 Aligner, GCA Stepper, Asher, SVG Track
            LPCVD: ASM 6’’ LPCVD – Poly, Nitride and LTO
            Oxidation/Diffusion: Bruce Furnace
            Plasma Deposition & Etch: Varian m2i, CVC 601, LAM 490, LAM 4600, Drytek Quad
            Implantation: Varian 350D Implanter
            Rapid Thermal Processing: AG610 A, AG610B
  • Metrology/Testing Tools
            Electron Microscopy: LEO Thermal Emission SEM
            Atomic Force Microscopy
            X-Ray Diffraction: Bruker AXS-D8 Discover System with a Vantec 2000 Area Detector
            Ellipsometry: Rudolph IV Ellipsometer, VASE Spectroscopic Ellipsometer
            IC Station: Keithley 4200 Semiconductor Characterization System
            Film Thickness: Tencor Alpha 200 Profilometer, Tencore SpectraMap SM300, Nanometrics Spectrophotometers
            Sheet Resistance: CDE Resmap
Design/Simulation
  • Cadence
  • Silvaco
  • Mentor Graphics IC Station
Languages
  • C, C++
  • Matlab, Octave
  • Python
  • Tcl/Tk, Expect
  • FORTRAN
  • 8085-x86 Assembly
Relevant Coursework
  • IC Technology
  • Silicon Processing
  • Thin Film Processes
  • Advanced Field Effect Devices
  • Semiconductor Devices and Process Modeling
  • Spintronics and Magnetic Random Access Memory (Online Course)
  • Memory Technology for 45nm and Beyond (IEDM)
  • Micro- and Nano-characterization (XRD/AFM)
  • Statistical Process Control
Relevant Class Projects
  • PMOS Fabrication at the SMFL
  • CMOS Fabrication at the SMFL
  • Design of RF LNA
  • Design on Comparator
  • Inductor Design for Analog IC applications
  • A Study of EHD Micropumps
Publications
Masters Thesis
  • S. S. Mukherjee, A Physics-Based Model of a SiC-Based MESFETs, RIT, 2004.
Journal
Conferences/Talks
  • S. S. Mukherjee et al., Invited Talk,, IBM T. J. Watson Research Center, Yorktown Heights, NY, 2009.
  • S. S. Mukherjee et al., 32nd Annual IEEE EDS/CAS Activities in W. NY Conf., 2008.
  • S. S. Mukherjee et al., ISDRS, WP7-02-05, 2005.
  • S. S. Mukherjee et al., Proc. IEEE Lester Eastman Conf., p. 114, NY, 2004.
  • J. C. Sippel et al., Proc. IEEE Can. Conf. Elect. Comp. Engg., p. 1401, 2004.
  • S. S. Mukherjee et al., ISDRS, p. 110, December 2003.
  • S. S. Mukherjee et al., 27th Annual IEEE EDS/CAS Activities in W. NY Conf., 2003.
Honors/Activities
  • Electrical Engg., Microelectronics Engg., and Microsystems Engg. Graduate Scholarship,
  • Student Member IEEE.
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