Assignment1           0305-221 Introduction to Micro/Nanolithography

Follow “Standard for Complete answer” for submitting all homework assignments.

1) Read “Introduction to Integrated Circuit Technology” Fourth Edition written by Scotten W. Jones on web from ICKnolwledge LLC.

a) Define photolithography.

b) List the seven steps of photolithography.

c) Explain why microlithography is also photolithography.

2) Locate and read the ITRS 2011 Edition for Lithography

a) For this year and the year you plan to graduate (report the year) list the technology  requirements of:

i) DRAM ½ pitch

ii) DRAM Overlay

iii) MPU Gate CD control

iv) MPU k1 (13.5nm) EUVL

v) Number of mask counts MPU

b) NOTE which of these requirements do not have known manufacturing solutions.

3) Report the following properties for the sample set of numbers listed below:

a) N

b) Sum

c) Mean

d) Median

e) Standard deviation

102.1

98.7

97.5

104.2

100.0

4) List the radiation sources used for microlithography, there approximate (assume k₁ = k values from Microlithography_trends.pdf) resolution ½ pitch and the year they went into production.